Wavefront measurements of imaging systems by comparing a Point-Diffraction Interferometer and a Shack-Hartmann wavefront sensor
A. Marzoa, S. Vallmitjana, S. Bosch
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Base Information
Volume
V51 - N2 / 2018 Ordinario
Reference
50027:1-10
DOI
http://doi.org/10.7149/OPA.51.2.50027
Language
English
Keywords
Optical Metrology, Wavefront, Aberrations, Shack-Hartmann, Interferometry.
Abstract
In this work, we present a comparative study between two notorious techniques for wavefront characterization: Shack-Hartmann wavefront sensor and the Point-Diffraction Interferometer. The main goal of this work is to experimentally demonstrate the equivalence of results when wavefront characterization measurements are carried out for both techniques, within the experimental error, in the case of imaging systems. The study has been carried out in several commercial convergent lenses obtaining small root-mean-square difference between both techniques. The results aim the possibility to design a dual set-up combining both techniques with potential use in Ophthalmic applications.
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